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1X Master Photomasks
Ranging from 3”x 3” to 9”x 9” in a variety of substrate types, thickness and resist coatings for contact and projection aligners.
Reduction reticles (1.8X, 2X, 2.5X, 4X, 5X, 10X) for various stepper types (e.g. ASML, Nikon, Canon) and 1X Ultratech reticles.
Direct Write Wafers
We can pattern your designs directly onto your supplied wafers. Ideal for prototyping, smaller runs and fast design requirements.
Copy Masks, ranging from 3”x 3” to 7”x 7” on both soda lime and quartz substrate, for contact and close-proximity lithography.
Our Grayscale Mask Technology allows you to sculpt 3D structures in photoresist.
Large Area Masks
A variety of substrate types available (QZ, SL, Borofloat) and mask sizes up to 20”x 20”.