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Comps Mask
1X Master Photomasks
Ranging from 3”x 3” to 9”x 9” in a variety of substrate types, thickness and resist coatings for contact and projection aligners.
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Comps Reticle
Reticles
Reduction reticles (1.8X, 2X, 2.5X, 4X, 5X, 10X) for various stepper types (e.g. ASML, Nikon, Canon) and 1X Ultratech reticles.
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Comps Wafer
Direct Write Wafers
We can pattern your designs directly onto your supplied wafers. Ideal for prototyping, smaller runs and fast design requirements.
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Comps Cleanroom Equip
Copy Masks
Copy Masks, ranging from 3”x 3” to 7”x 7” on both soda lime and quartz substrate, for contact and close-proximity lithography.
Grayscale Masks
Our Grayscale Mask Technology allows you to sculpt 3D structures in photoresist.
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Comps LAM
Large Area Masks
A variety of substrate types available (QZ, SL, Borofloat) and mask sizes up to 20”x 20”.
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