Comps LAM

Mask Cleaning

Maintaining mask quality in usage is a challenge, and while photomasks are robust, they are not indestructible. The lithography processes used by our customers, regardless of sector, demand that the mask has a level of pattern integrity that enables devices to be manufactured without any imperfections, which may affect performance.

Our cleaning processes combine both chemical and physical methods. A mixture of sulphuric acid and hydrogen peroxide is used to remove photoresist and organic contaminants.

We prioritize quick turns to minimize critical delays or line-stop in fab.



  • Same-day cycle time is available
  • Use purpose-designed automatic single-substrate mask cleaning tools such as the HMR900, ASC500, or Suss HMx
  • Chrome & iron oxide masks can be cleaned as required
Comps Micro
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