Our customers, regardless of industry or application, benefit from our willingness to share best practice for mask layout and definition. Quality is in-built and we appreciate the criticality of on-time delivery for you and your end customers. We provide:
- Expert data prep support and strategies to allow the best possible resolution of non-Manhattan geometries/curved features
- Lithography and process equipment investment to achieve better resolution on applications (e.g. waveguides and SAW devices)
- Support of a variety of materials type, resist and sizes typically from 3”x 3" - 9"x 9" 1X Masters (capability up to 20”x 20" LAMs) and 5”x 5" & 6”x 6" reticles
- Support of reticles for Multi-Project Wafer (MPW) runs, Multi-Layer Reticles (MLRs) and Photonic Integrated Circuits (PICs).