9 results

MacuSpec™ VF-TH 500

High-performance, simultaneous via filling and through hole plating acid copper metallization process for high density interconnects.

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MacuSpec™ HT 200

Direct Current (DC) acid copper plating system that delivers High-Throwing (HT) power for high aspect ratio through holes.

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MacuSpec™ HT 300

Advanced DC acid copper plating system that provides pulse-like performance for thicker mid-range through-hole metallization.

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MacuSpec™ HT 360

State-of-the-art DC acid copper plating process that enables high-throw, high-volume production with no need for pulse plating.

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MacuSpec™ PPR 100 & 200

Pulse plating processes that enable precise thickness uniformity, reliable thermal cycle performance, and superior throwing power.

 

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MacuSpec™ MPR 100

Cost-effective periodic pulse reverse process that provides higher throwing power, reduced surface copper, and increased plating rates.

 

 

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MacuSpec™ VF Series

Via filling copper metallization solutions that provide the most stable and consistent via filling available on the market today.

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MacuSpec™ AVF Series

Advanced via fill copper metallization processes for high-density interconnects.

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MacuSpec™ VF-TH Series

Copper plating baths that can simultaneously fill copper microvias and plate through holes with aspect ratios of up to 8:1.

 

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