25 results

MICROFAB® SC

High-speed copper plating process for copper pillars in flip chip packages, copper microbumps in 3D interconnects, and RDL.

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MICROFAB® SC-32

Acid copper plating process offers excellent throwing power, improved leveling characteristics, and ductile, low-stress deposits.

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MICROFAB® SC-40

High-speed copper plating process enables flat bump shape, engineered for high-speed pillar, copper stud, and UBM applications.

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MICROFAB® SC-40 PLUS

Next-generation high-speed copper plating process delivers high-purity deposits with cutting-edge uniformity.

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MICROFAB® SC-50

High-speed copper plating process delivers accurate bump height uniformity and bump shape control.

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MICROFAB® SN-300/302

High-speed low-alpha pure tin plating process produces compact grain structures and uniform surface morphology.

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MICROFAB® SN-350

Low-alpha pure tin plating process enables high-speed electro-deposition of smooth, fine-grained, uniform tin bumps.

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MICROFAB® TS-650 NXG

Tin-silver bump metallization bath allows high-speed electro-deposition of smooth, fine-grained, uniform tin silver alloy bumps.

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MICROFAB® SPM-1100

Copper plating solution provides superior coplanarity in a low KV system and exceptional uniformity.

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MICROFAB® AU660

Mild alkaline non-cyanide gold electroplating process for backside interconnects (via liners) and fine pitch pattern gold bumping.

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