MICROFAB® TS-650 NXG

Tin-silver bump metallization bath allows high-speed electro-deposition of smooth, fine-grained, uniform tin silver alloy bumps.

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Product Overview

MICROFAB TS-650 NXG is the tin-silver bump, pillar, and capping metallization process for wafer level packaging designs where coplanarity, bond strength, and optimized process throughput are the goals. The tunable tin-silver alloy produced by MICROFAB TS-650 NXG reduces the propensity for whiskering while providing a lower melting point for reflow and higher resistance to mechanical stress.

Product Features

Wafer level packaging
Organic Sulfonate-Based Electrolytes for Semiconductor Wafer Plating

The process is suited for high-speed electrodeposition, producing smooth surface morphology, solderable reflowed bumps with tight control of alloy compositions.

Pre-Reflow Uniformity, Wide Process Window, Tin-Silver Capping

Designed for lead-free and capping applications, MICROFAB TS-650 NXG provides exceptional uniformity Within-Wafer (WIW), Within-Die (WID), and Within-Feature (WIF).

Industry Leading Copper Pillar Plating Technologies

MICROFAB TS-650 NXG is the coating of choice for excellent solderability of chip or package to substrate.

Featured Applications

Excellent WID / WIW Height Uniformity
Bumping and Capping

MICROFAB TS-650 NXG is designed for a wide range of flip chip, FOWLP, 2.5D/3D bumping, C4 bumping (mushroom, in-via), mBump, and capping applications.

Product Documentation

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