Nickel Solutions

Nickel sulfamate processes, including boric acid-free options, produce pure, ductile, fine-grained, matte, low-stress deposits.

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Product Overview

Our MICROFAB® Nickel solutions include sulfamate nickel, barrier electroplating processes designed to provide pure, ductile, fine-grained, low stress, matte nickel deposits. These processes are developed to meet the needs of the semiconductor industry for quality assured chemistry. Our MICROFAB Nickel solutions include MICROFAB EVF NiBAR, MICROFAB Ni-200, and MICROFAB Ni-100.

Product Features

Wafer level packaging
Barrier Technology for High Performance Packages

MICROFAB Nickel solutions provide high speed deposition with bright, smooth, stress tunable, fine-grained deposits. 

Boric Acid-Free Options for Regulatory Compliance

MICROFAB EVF NiBAR is the leading boric acid-free electrolytic nickel for barrier, via fill, bump, Under-Bump Metallization (UBM) and Redistribution Layer (RDL) applications.

Featured Applications

Barrier Technology

MICROFAB Nickel Solutions are part of our historic POR barrier technology and tool OEM BKM.

Via Fill

MICROFAB EVF NiBAR is a direct barrier replacement for our historical POR MICROFAB NI200B that is viafill capable and stress adjustable.

Product Documentation

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