UltraStrip LDI

Resist stripping system designed to strip fully aqueous and tough-to-strip LDI dry films and conventional dry film photoresists.

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Product Overview

The UltraStrip product line represents our most advanced, high-performance photoresist strippers. Designed to strip fully aqueous dry film photoresists, the system features a unique blend of components that promotes a high strip rate, easily filterable particles, and complete removal of dry film residues and adhesion promoters. UltraStrip contains no caustic, glycol ethers, or other solvents, so it will not attack copper, tin, or tin-lead.