961 results

MICROFAB® SPM-1100

Copper plating solution provides superior coplanarity in a low KV system and exceptional uniformity.

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MICROFAB® SN-350

Low-alpha pure tin plating process enables high-speed electro-deposition of smooth, fine-grained, uniform tin bumps.

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MICROFAB® Pure BP

Pure copper process with high KV resistance, engineered for copper pillar, copper stud and Under-Bump Metallization (UBM) applications.

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MICROFAB® AU660

Mild alkaline non-cyanide gold electroplating process for backside interconnects (via liners) and fine pitch pattern gold bumping.

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Nickel Solutions

Nickel sulfamate processes, including boric acid-free options, produce pure, ductile, fine-grained, matte, low-stress deposits.

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NOVAFAB® Pd Acid Strike

Pure palladium acid pre-plate delivers thin Pd deposits for a wide range of current densities and electroplating conditions, specifically optimized for FOWLP solder surfaces.

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NOVAFAB® HPM-500

High-performance copper process provides superior coplanarity and exceptional within-die, and within-feature uniformity.

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NOVAFAB® VIA FILL AU

Industry-leading cyanide-, arsenic-, thallium- and lead-free gold process capable of via filling with low surface roughness.

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MICROFAB® AU660

Mild alkaline, non-cyanide gold electroplating process for MEMS, ideal for backside interconnects (via liners) and fine-pitch pattern gold bumping with superior coverage.

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BDT-510

A trusted alkaline, non-cyanide electroplating system for MEMS, delivering bright, ductile gold deposits with exceptional purity and ease of use.

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