961 results

MICROFAB® SC-32

Acid copper plating process offers excellent throwing power, improved leveling characteristics, and ductile, low-stress deposits.

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MICROFAB® SC-40

High-speed copper plating process enables flat bump shape, engineered for high-speed pillar, copper stud, and UBM applications.

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MICROFAB® SC-50

High-speed copper plating process delivers accurate bump height uniformity and bump shape control.

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NOVAFAB® AG-340

Cyanide-free electroplating process designed to deliver superior deposits for wafer plating applications.

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NOVAFAB® Pd Acid Strike

Pure palladium acid pre-plate delivers thin Pd deposits for a wide range of current densities and electroplating conditions.

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MICROFAB® AU3151

Mild alkaline non-cyanide high-purity hardness gold electroplating process with proven reliability and bondability.

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MICROFAB® AU100 CT DEPLATE

Non-cyanide gold seed deplate reduces costs by selectively stripping gold seed metallization.

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Palladex PC-1 Palladium Cobalt

Electroplating process for Palladium Cobalt alloy delivers exceptional durability and corrosion resistance.

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BDT-510

Trusted alkaline non-cyanide electroplating system known for its bright appearance and ease of use.

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MICROFAB® AU310-T

Gold electroplating process provides an arsenic-free bright plating solution with superior surface roughness for fine pitch bumping.

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